Invention Grant
US09200364B2 Film forming apparatus, film forming method, method for optimizing rotational speed, and storage medium 有权
成膜装置,成膜方法,转速优化方法和储存介质

  • Patent Title: Film forming apparatus, film forming method, method for optimizing rotational speed, and storage medium
  • Patent Title (中): 成膜装置,成膜方法,转速优化方法和储存介质
  • Application No.: US13579299
    Application Date: 2011-03-18
  • Publication No.: US09200364B2
    Publication Date: 2015-12-01
  • Inventor: Shozo Ito
  • Applicant: Shozo Ito
  • Applicant Address: JP Minato-Ku
  • Assignee: Tokyo Electron Limited
  • Current Assignee: Tokyo Electron Limited
  • Current Assignee Address: JP Minato-Ku
  • Agency: Burr & Brown, PLLC
  • Priority: JP2010-063928 20100319; JP2010-259567 20101119
  • International Application: PCT/JP2011/056546 WO 20110318
  • International Announcement: WO2011/115250 WO 20110922
  • Main IPC: C23C16/52
  • IPC: C23C16/52 C23C16/455 C23C16/515 C23C16/507 C23C16/458 C23C16/34
Film forming apparatus, film forming method, method for optimizing rotational speed, and storage medium
Abstract:
A film forming apparatus for forming a film on an object includes: a processing container; gas supply means, having gas jet ports, respectively; a holding means for holding the object; a drive mechanism for moving the holding means relative to the gas jet ports; and a control means which, when repeating P times a cycle, consisting of a supply period for supplying a gas and a supply stop period during which the supply of the gas is stopped, performs control so that as viewed from the center of the object, a gas supply starting position is sequentially shifted in the circumferential direction of the object for every cycle in such a manner that the entire circumference of the object to be processed is divided into K segments (K=P), K being an arbitrary division number, and the gas supply starting position is shifted by one segment for every cycle.
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