Invention Grant
- Patent Title: Passivation composition and process
- Patent Title (中): 钝化成分和工艺
-
Application No.: US13657367Application Date: 2012-10-22
-
Publication No.: US09200372B2Publication Date: 2015-12-01
- Inventor: William A. Wojtczak , Bing Du , Tomonori Takahashi
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C23F1/14
- IPC: C23F1/14 ; H01L21/02 ; C23F1/44 ; H01L21/321 ; H01L21/3213 ; C23C22/48 ; C23F1/16 ; H01L21/285
Abstract:
This disclosure relates to a passivation composition containing at least one sulfonic acid, at least one compound containing a nitrate or nitrosyl ion, and water. The passivation composition is substantially free of a halide ion.
Public/Granted literature
- US20130122701A1 Novel Passivation Composition and Process Public/Granted day:2013-05-16
Information query
IPC分类:
