Invention Grant
US09202671B2 Charged particle beam apparatus and sample processing method using charged particle beam apparatus 有权
带电粒子束装置和采用带电粒子束装置的样品处理方法

Charged particle beam apparatus and sample processing method using charged particle beam apparatus
Abstract:
A charged particle beam apparatus includes a sample stage, a focused ion beam column, a scattered electron detector that detects backscattered electrons generated from a cross-section of a sample, a crystal orientation information generation unit that generates crystal orientation information on a predetermined region of the cross-section, and an angle calculation unit that calculates attachment angles of the sample stage, corresponding to a direction of the cross-section. In response to receiving input of information indicating that the crystal orientation information on the region displayed on a display unit is changed to aimed second crystal orientation information, the angle calculation unit calculates the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and the focused ion beam column performs etching processing on the cross-section at the calculated attachment angles.
Information query
Patent Agency Ranking
0/0