Invention Grant
- Patent Title: Via placement in radio frequency shielding applications
- Patent Title (中): 通过放置在射频屏蔽应用中
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Application No.: US14577910Application Date: 2014-12-19
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Publication No.: US09203529B2Publication Date: 2015-12-01
- Inventor: Howard E. Chen , Matthew Sean Read , Hoang Mong Nguyen , Anthony James LoBianco , Guohao Zhang , Dinhphuoc Vu Hoang
- Applicant: Skyworks Solutions, Inc.
- Applicant Address: US MA Woburn
- Assignee: Skyworks Solutions, Inc.
- Current Assignee: Skyworks Solutions, Inc.
- Current Assignee Address: US MA Woburn
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: H04B1/04
- IPC: H04B1/04 ; H04B1/10 ; H05K9/00 ; H04B15/02 ; H01L23/552 ; H04B1/16 ; H01L21/56 ; H01L23/00 ; H01Q1/52 ; H04B1/44 ; H05K1/02 ; H05K1/11 ; G06F17/50 ; H04B15/04

Abstract:
Aspects of the present disclosure relate to determining the location and/or density of vias that form part of an RF isolation structure of a packaged module and the resulting RF isolation structures. From electromagnetic interference (EMI) data, locations of where via density can be increased and/or decreased without significantly degrading the EMI performance of the RF isolation structure can be identified. In certain embodiments, one or more vias can be added and/or removed from a selected area of the packaged module based on the EMI data.
Public/Granted literature
- US20150126139A1 VIA PLACEMENT IN RADIO FREQUENCY SHIELDING APPLICATIONS Public/Granted day:2015-05-07
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