Invention Grant
- Patent Title: Wiring substrate and method of manufacturing the same
- Patent Title (中): 接线基板及其制造方法
-
Application No.: US14202220Application Date: 2014-03-10
-
Publication No.: US09204544B2Publication Date: 2015-12-01
- Inventor: Michio Horiuchi , Ryo Fukasawa , Yuichi Matsuda , Yasue Tokutake
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano-shi
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano-shi
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2013-051537 20130314
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H01L23/14 ; H01L23/498 ; H01L21/48 ; H05K3/40

Abstract:
A wiring substrate includes, an insulating substrate in which a plurality of penetration conductors are provided, the penetration conductors penetrating in a thickness direction of the insulating substrate, a first connection pad arranged on one face of the insulating substrate, a second connection pad arranged to correspond to the first connection pad on other face of the insulating substrate, a first metal layer arranged to surround the first connection pad, a second metal layer arranged to correspond to the first metal layer, the second metal layer surrounding the second connection pad, the plurality of penetration conductors connecting the first connection pad and the second connection pad, and connecting the first metal layer and the second metal layer, and an elastic body formed in a part of the insulating substrate between the first and second connection pads, and the first and second metal layers.
Public/Granted literature
- US20140262465A1 WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-09-18
Information query