Invention Grant
- Patent Title: Methods of manufacturing abrasive particle and polishing slurry
- Patent Title (中): 制造磨粒和抛光浆的方法
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Application No.: US14483140Application Date: 2014-09-10
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Publication No.: US09206337B2Publication Date: 2015-12-08
- Inventor: Seung Won Jung
- Applicant: UBMATERIALS INC.
- Applicant Address: KR
- Assignee: INDUSTRIAL BANK OF KOREA
- Current Assignee: INDUSTRIAL BANK OF KOREA
- Current Assignee Address: KR
- Priority: KR10-2013-0109872 20130912
- Main IPC: C09K13/00
- IPC: C09K13/00 ; C09G1/02 ; C09K3/14 ; C01F17/00
Abstract:
Provided is a method of manufacturing an abrasive particle including a mother particle and a plurality of auxiliary particles formed on a surface of the mother particle, and a method of manufacturing a polishing slurry in which the abrasive particle is mixed with a polishing accelerating agent and a pH adjusting agent.
Public/Granted literature
- US20150069291A1 METHODS OF MANUFACTURING ABRASIVE PARTICLE AND POLISHING SLURRY Public/Granted day:2015-03-12
Information query
