Invention Grant
US09206524B2 Conductivity based on selective etch for GaN devices and applications thereof
有权
基于GaN器件的选择性蚀刻的电导率及其应用
- Patent Title: Conductivity based on selective etch for GaN devices and applications thereof
- Patent Title (中): 基于GaN器件的选择性蚀刻的电导率及其应用
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Application No.: US13559199Application Date: 2012-07-26
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Publication No.: US09206524B2Publication Date: 2015-12-08
- Inventor: Yu Zhang , Qian Sun , Jung Han
- Applicant: Yu Zhang , Qian Sun , Jung Han
- Applicant Address: US CT New Haven
- Assignee: Yale University
- Current Assignee: Yale University
- Current Assignee Address: US CT New Haven
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: C25F3/12
- IPC: C25F3/12 ; C25B1/00 ; H01L21/306 ; H01L21/3063 ; H01L21/02 ; H01L33/00 ; H01L33/32 ; C30B29/40

Abstract:
This invention relates to methods of generating NP gallium nitride (GaN) across large areas (>1 cm2) with controlled pore diameters, pore density, and porosity. Also disclosed are methods of generating novel optoelectronic devices based on porous GaN. Additionally a layer transfer scheme to separate and create free-standing crystalline GaN thin layers is disclosed that enables a new device manufacturing paradigm involving substrate recycling. Other disclosed embodiments of this invention relate to fabrication of GaN based nanocrystals and the use of NP GaN electrodes for electrolysis, water splitting, or photosynthetic process applications.
Public/Granted literature
- US20130011656A1 Conductivity Based on Selective Etch for GaN Devices and Applications Thereof Public/Granted day:2013-01-10
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