Invention Grant
- Patent Title: Determining threshold voltage variations in field effect transistors
- Patent Title (中): 确定场效应晶体管的阈值电压变化
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Application No.: US14224172Application Date: 2014-03-25
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Publication No.: US09209167B2Publication Date: 2015-12-08
- Inventor: Ning Lu
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Gibb & Riley, LLC
- Agent Anthony J. Canale
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L27/02 ; H01L27/085

Abstract:
Disclosed are a method and a system for determining threshold voltage (Vt) variations in field effect transistors (FETs), wherein multiple field effect transistors (FETs) (e.g., at least a first FET and a second FET), which are similar in design except for having different effective channel widths, can be selected for processing. Information regarding these multiple FETs (e.g., the ratio of the different effective channel widths and other information) can be acquired and used to define the relation between a standard deviation of an uncorrelated Vt variation and a difference between a first average Vt associated with the first FET and a second average Vt associated with the second FET. The relation can, depending upon the FET layouts, be used for different purposes (e.g., for characterizing the threshold voltage mismatch between a pair of adjacent essentially identical FETs on a chip or for characterizing a width scaling relation).
Public/Granted literature
- US20150279831A1 DETERMINING THRESHOLD VOLTAGE VARIATIONS IN FIELD EFFECT TRANSISTORS Public/Granted day:2015-10-01
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