Invention Grant
- Patent Title: Thin film transistor array panel having double-layered oxide semiconductor structure and method for manufacturing the same
- Patent Title (中): 具有双层氧化物半导体结构的薄膜晶体管阵列面板及其制造方法
-
Application No.: US14291535Application Date: 2014-05-30
-
Publication No.: US09209313B2Publication Date: 2015-12-08
- Inventor: Young Joo Choi , Joon Geol Kim , Seung-Ho Jung , Kang Moon Jo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0145937 20131128
- Main IPC: G02F1/1343
- IPC: G02F1/1343 ; H01L29/786 ; H01L29/66 ; H01L27/12

Abstract:
A thin film transistor array panel includes: a gate line including a gate electrode; a first gate insulating layer on the gate line; a semiconductor layer on the first gate insulating layer and overlapping the gate electrode; a second gate insulating layer on the semiconductor layer and the first gate insulating layer, and an opening in the second gate insulating layer and through which the semiconductor layer is exposed; drain and source electrodes on the second gate insulating and semiconductor layers and facing each other; a first field generating electrode; and a second field generating electrode connected to the drain electrode. The semiconductor layer includes an oxide semiconductor layer, and first and second auxiliary layers on the oxide semiconductor layer and separated from each other. An edge of the drain and source electrodes is disposed inside an edge of the first and second auxiliary layers, respectively.
Public/Granted literature
- US20150144939A1 THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2015-05-28
Information query
IPC分类: