Invention Grant
- Patent Title: Overlay mark assistant feature
- Patent Title (中): 叠加标记助手功能
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Application No.: US13969005Application Date: 2013-08-16
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Publication No.: US09214347B2Publication Date: 2015-12-15
- Inventor: Hsin-Chieh Yao , Hsien-Cheng Wang , Huang Chien Kai , Chun-Kuang Chen
- Applicant: Taiwan Semiconductor Manufacturing Company Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/28
- IPC: H01L21/28 ; G03F7/20 ; H01L23/544
Abstract:
A method and apparatus for alignment are disclosed. An exemplary apparatus includes a substrate having an alignment region; an alignment feature in the alignment region of the substrate; and a dummy feature disposed within the alignment feature. A dimension of the dummy feature is less than a resolution of an alignment mark detector.
Public/Granted literature
- US20130330904A1 OVERLAY MARK ASSISTANT FEATURE Public/Granted day:2013-12-12
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