Invention Grant
- Patent Title: Three-direction alignment mark
- Patent Title (中): 三向对准标记
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Application No.: US14192225Application Date: 2014-02-27
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Publication No.: US09217917B2Publication Date: 2015-12-22
- Inventor: Ru-Shang Hsiao , I-I Cheng , Jia-Ming Huang , Jen-Pan Wang , Ling-Sung Wang , Chih-Mu Huang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/76
- IPC: H01L21/76 ; G03F1/42 ; H01L23/544 ; H01L21/027 ; G06T7/00

Abstract:
A semiconductor device includes a first material formed on a substrate. The first material includes a first alignment mark. The first alignment mark includes alignment lines in at least three directions. The semiconductor device further includes a second material comprising a second alignment mark. The second alignment mark corresponds to the first alignment mark such that when the second alignment mark is aligned with the first alignment mark, the second material is aligned with the first material.
Public/Granted literature
- US20150241768A1 Three-Direction Alignment Mark Public/Granted day:2015-08-27
Information query
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