Invention Grant
- Patent Title: Method for fabricating a porous carbon structure using optical interference lithography, and porous carbon structure fabricated by same
- Patent Title (中): 使用光学干涉光刻制造多孔碳结构的方法，以及由其制造的多孔碳结构
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Application No.: US13575292Application Date: 2010-04-15
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Publication No.: US09217935B2Publication Date: 2015-12-22
- Inventor: Jun Hyuk Moon , Woo Min Jin , Juhwan Shin
- Applicant: Jun Hyuk Moon , Woo Min Jin , Juhwan Shin
- Applicant Address: KR Seoul
- Assignee: Industry-University Cooperation Foundation Sogang University
- Current Assignee: Industry-University Cooperation Foundation Sogang University
- Current Assignee Address: KR Seoul
- Agency: Brundidge & Stanger, P.C.
- Priority: KR10-2010-0006672 20100125
- International Application: PCT/KR2010/002359 WO 20100415
- International Announcement: WO2011/090233 WO 20110728
- Main IPC: G03H1/02
- IPC: G03H1/02 ; G03F7/20 ; G03F7/40 ; G03H1/04
Abstract:
Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a porous carbon structure using optical light interference lithography includes: forming a photoresist layer on a substrate; irradiating a three-dimensional optical interference pattern onto the photoresist formed using three-dimensional optical interference lithography to form a three-dimensional porous photoresist pattern; coating the formed three-dimensional porous photoresist pattern with an inorganic material; heating the photoresist pattern on which the inorganic material is coated to carbonize the pattern; and removing the coated inorganic material.
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