Invention Grant
- Patent Title: Interferometric measurement of rotation of stage apparatus and adjustment method thereof, exposure apparatus and method of manufacturing device
- Patent Title (中): 舞台装置的旋转干涉测量及其调节方法，曝光装置及制造装置的方法
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Application No.: US14065681Application Date: 2013-10-29
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Publication No.: US09217937B2Publication Date: 2015-12-22
- Inventor: Zenichi Hamaya , Keiji Emoto , Ryo Takai , Shinichiro Hirai
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2012-246663 20121108
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G03F9/00
Abstract:
A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.
Public/Granted literature
- US20140125962A1 STAGE APPARATUS AND ADJUSTMENT METHOD THEREOF, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2014-05-08
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