Invention Grant
- Patent Title: Electrostatic chuck having reduced arcing
- Patent Title (中): 静电吸盘具有减少的电弧
-
Application No.: US12270187Application Date: 2008-11-13
-
Publication No.: US09218997B2Publication Date: 2015-12-22
- Inventor: Seok Yul Jun , Bum Jin Park , Sun Il Kim , Hyong Seok Oh , Sung Chul Cho , Young Sam Na , Yeon Sang Cho , Ha Sung Song , Seong Ju Kim , Hee Sang Chae , Talex Sajoto
- Applicant: Seok Yul Jun , Bum Jin Park , Sun Il Kim , Hyong Seok Oh , Sung Chul Cho , Young Sam Na , Yeon Sang Cho , Ha Sung Song , Seong Ju Kim , Hee Sang Chae , Talex Sajoto
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C16/50
- IPC: C23C16/50 ; C23C16/00 ; C23F1/00 ; H01L21/306 ; H01L21/683 ; H01L21/67 ; H02N13/00

Abstract:
Electrostatic chucks and methods of manufacturing the same are provided herein. In some embodiments, an electrostatic chuck comprises an electrically conductive body having one or more channels formed in an upper surface thereof; a plate positioned within the one or more channels to define one or more plenums between the body and the plate, wherein the surfaces of the plenum are anodized; one or more fluid passages disposed in the plate and fluidly coupling the one or more plenums to the upper surface of the body, wherein the surfaces of the fluid passages are electrically insulated; and a dielectric layer disposed over the upper surface of the body and the plate, wherein the dielectric layer forms a support surface for a substrate to be disposed thereon.
Public/Granted literature
- US20100109263A1 ELECTROSTATIC CHUCK HAVING REDUCED ARCING Public/Granted day:2010-05-06
Information query
IPC分类: