Invention Grant
- Patent Title: Handling device and handling method thereof
- Patent Title (中): 处理装置及其处理方法
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Application No.: US14456185Application Date: 2014-08-11
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Publication No.: US09219256B2Publication Date: 2015-12-22
- Inventor: Wei-Jung Hsieh
- Applicant: AU OPTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: AU OPTRONICS CORP.
- Current Assignee: AU OPTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agency: WPAT, PC
- Agent Justin King
- Priority: TW103113746A 20140415
- Main IPC: B66F19/00
- IPC: B66F19/00 ; H01L51/56 ; B25J15/00

Abstract:
A handling device is used for handling a substrate. The handling device includes a holder, a moving element, at least one first adhesive chuck, and at least one second adhesive chuck. The moving element is located adjacent to the holder for moving relative to the holder along a first axial direction. The first adhesive chuck is located on a first surface of the holder and the second adhesive chuck is located on a first surface of the moving element, in which the first adhesive chuck and the second adhesive chuck are used to be respectively separated from the substrate adhered thereon. In addition, another embodiment of the invention discloses a handing method of the handing device.
Public/Granted literature
- US20150295206A1 HANDLING DEVICE AND HANDLING METHOD THEREOF Public/Granted day:2015-10-15
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