Invention Grant
- Patent Title: Apparatus and method for purifying gas
- Patent Title (中): 气体净化装置及方法
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Application No.: US14086669Application Date: 2013-11-21
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Publication No.: US09227155B2Publication Date: 2016-01-05
- Inventor: Kyung-Hyun Ahn
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Samsung-ro, Giheung-Gu, Yongin-si, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Samsung-ro, Giheung-Gu, Yongin-si, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2013-0045559 20130424
- Main IPC: A61L9/00
- IPC: A61L9/00 ; A62B7/08 ; B01D53/22

Abstract:
A gas purifying apparatus and a method thereof are disclosed. According to an exemplary embodiment, a gas purifying apparatus includes a first chamber comprising a first inlet into which a first fluid flows and a first outlet through which a part of the first fluid is discharged, a purifier which purifies air from the first chamber, which air is then re-injected into the first chamber and a conduit which transports air from the first chamber to the purifier.
Public/Granted literature
- US20140322071A1 APPARATUS AND METHOD FOR PURIFYING GAS Public/Granted day:2014-10-30
Information query