Invention Grant
- Patent Title: Semiconductor optical waveguide device and method for manufacturing the same
- Patent Title (中): 半导体光波导器件及其制造方法
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Application No.: US14198261Application Date: 2014-03-05
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Publication No.: US09229168B2Publication Date: 2016-01-05
- Inventor: Akira Furuya , Takamitsu Kitamura , Hideki Yagi , Naoya Kono
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell LLP.
- Priority: JP2013-046976 20130308
- Main IPC: G02B6/12
- IPC: G02B6/12 ; B82Y20/00 ; G02B6/30 ; G02B6/122 ; G02F1/225 ; G02B6/136 ; G02F1/017 ; G02F1/21

Abstract:
A semiconductor optical waveguide device includes a substrate having a first area and a second area, and first, second, and semiconductor mesas on the substrate. The first semiconductor mesa includes a cladding layer and a first mesa portion on the second area, the first mesa portion including first and second portions. The second semiconductor mesa includes an intermediate layer, a first core layer, and first and second mesa portions on the first and second areas, respectively. The third semiconductor mesa includes a second core layer, and first and second mesa portions having a greater width than that of the second semiconductor mesa. The first portion of the first semiconductor mesa has a substantially same width as the second mesa portion of the second semiconductor mesa. The first core layer is optically coupled to the second core layer through the intermediate layer disposed between the first and second core layers.
Public/Granted literature
- US20140254998A1 SEMICONDUCTOR OPTICAL WAVEGUIDE DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-09-11
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