Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US13196446Application Date: 2011-08-02
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Publication No.: US09229320B2Publication Date: 2016-01-05
- Inventor: Koji Ichikawa , Satoshi Yamamoto
- Applicant: Koji Ichikawa , Satoshi Yamamoto
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-174198 20100803
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/20

Abstract:
A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.
Public/Granted literature
- US20120034563A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2012-02-09
Information query
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