Invention Grant
- Patent Title: Salt and photoresist composition comprising the same
- Patent Title (中): 包含其的盐和光致抗蚀剂组合物
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Application No.: US14565538Application Date: 2014-12-10
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Publication No.: US09229321B2Publication Date: 2016-01-05
- Inventor: Tatsuro Masuyama , Koji Ichikawa , Kaoru Araki
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-257742 20131213
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; G03F7/039 ; G03F7/40 ; G03F7/20 ; C07C309/00 ; C07C309/04 ; C07C319/02
Abstract:
A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group; Lb1 represents a C1-C24 divalent saturated hydrocarbon group or the like; R1, R2, R3 and R4 independently in each occurrence represent a C1-C12 aliphatic hydrocarbon group, or the like; and Z+ represents an organic counter ion.
Public/Granted literature
- US20150168828A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2015-06-18
Information query
IPC分类:
