Invention Grant
- Patent Title: Electron beam exposure apparatus and method of detecting error using the same
- Patent Title (中): 电子束曝光装置及其检测方法
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Application No.: US14446736Application Date: 2014-07-30
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Publication No.: US09229327B2Publication Date: 2016-01-05
- Inventor: Sang Yong Yu , Sang Hee Lee , Seong Yong Moon
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0120901 20131010
- Main IPC: H01J37/244
- IPC: H01J37/244 ; G03F7/20 ; H01J37/304 ; H01J37/317
Abstract:
An electron beam exposure apparatus includes an electron beam source, a stage, and an error detection device. The electron beam source radiates a first electron beam corresponding to first input data and a second electron beam corresponding to second input data. The stage includes a mask on which the first electron beam is radiated. The stage may be configured to move the mask. The error detection device detects an error of the second electron beam and outputs error detection information.
Public/Granted literature
- US20150102236A1 ELECTRON BEAM EXPOSURE APPARATUS AND METHOD OF DETECTING ERROR USING THE SAME Public/Granted day:2015-04-16
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