Invention Grant
- Patent Title: Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
- Patent Title (中): 基板，测量属性的方法，检查装置和光刻设备
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Application No.: US13059405Application Date: 2009-07-27
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Publication No.: US09229338B2Publication Date: 2016-01-05
- Inventor: Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
- Applicant: Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2009/005419 WO 20090727
- International Announcement: WO2010/025793 WO 20100311
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03B27/32 ; G03B27/54 ; G03B27/74 ; H01L23/28 ; G03F7/20 ; G03F9/00 ; H01L23/544
Abstract:
Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
Public/Granted literature
- US20110205518A1 Substrate, a Method of Measuring a Property, an Inspection Apparatus and a Lithographic Apparatus Public/Granted day:2011-08-25
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