Invention Grant
- Patent Title: Power switching device and method of manufacturing the same
- Patent Title (中): 电力开关装置及其制造方法
-
Application No.: US13927230Application Date: 2013-06-26
-
Publication No.: US09231057B2Publication Date: 2016-01-05
- Inventor: Woo-chul Jeon , Young-hwan Park , Ki-yeol Park , Jai-kwang Shin , Jae-joon Oh
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2012-0109266 20120928
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L21/332 ; H01L29/20 ; H01L29/66 ; H01L29/861 ; H01L29/205

Abstract:
A power switching device includes a channel forming layer on a substrate which includes a 2-dimensional electron gas (2DEG), and a channel supply layer which corresponds to the 2DEG at the channel forming layer. A cathode is coupled to a first end of the channel supply layer and an anode is coupled to a second end of the channel supply layer. The channel forming layer further includes a plurality of depletion areas arranged in a pattern, and portions of the channel forming layer between the plurality of depletion areas are non-depletion areas.
Public/Granted literature
- US20140091312A1 POWER SWITCHING DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-04-03
Information query
IPC分类: