Invention Grant
- Patent Title: Method of producing barrier film exhibiting excellent gas barrier property, and barrier film
- Patent Title (中): 制造阻气性优异的阻挡膜的方法和阻挡膜
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Application No.: US13392581Application Date: 2010-07-14
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Publication No.: US09231138B2Publication Date: 2016-01-05
- Inventor: Tomonori Kawamura
- Applicant: Tomonori Kawamura
- Applicant Address: JP
- Assignee: KONICA MINOLTA, INC.
- Current Assignee: KONICA MINOLTA, INC.
- Current Assignee Address: JP
- Agency: Cantor Colburn LLP
- Priority: JP2009-202395 20090902
- International Application: PCT/JP2010/061878 WO 20100714
- International Announcement: WO2011/027619 WO 20110310
- Main IPC: H01L51/44
- IPC: H01L51/44 ; H01L51/52 ; H01L31/0392 ; H01L51/00

Abstract:
Provided are a barrier film production method and a barrier film comprising at least one organic layer and two or more inorganic layers on a surface of a plastic film, wherein, under an atmosphere of at least 0.3 atmospheric pressure and at most 1.1 atmospheric pressure (1 atmospheric pressure is 1.01325×105 Pa), an organic layer coating liquid is applied on at least one surface of the plastic film, and dried to form the organic layer, thereafter, an inorganic layer coating liquid containing an inorganic compound is applied and dried on the organic layer to laminate at least 2 to 6 inorganic layers, and thereafter, at least two layers of the laminated inorganic layers are subjected to a conversion process.
Public/Granted literature
- US20120153421A1 BARRIER FILM AND PRODUCTION METHOD THEREOF Public/Granted day:2012-06-21
Information query
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