Invention Grant
- Patent Title: Resistance-variable memory device including carbide-based solid electrolyte membrane and manufacturing method thereof
- Patent Title (中): 包括碳化物类固体电解质膜的电阻变化记忆装置及其制造方法
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Application No.: US13120547Application Date: 2009-09-22
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Publication No.: US09231198B2Publication Date: 2016-01-05
- Inventor: Hyun-Sang Hwang , Myeong-Bum Pyun
- Applicant: Hyun-Sang Hwang , Myeong-Bum Pyun
- Applicant Address: KR Gwangju
- Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gwangju
- Agency: Osha Liang LLP
- Priority: KR10-2008-0093399 20080923
- International Application: PCT/KR2009/005379 WO 20090922
- International Announcement: WO2010/036001 WO 20100401
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
Disclosed are a resistance-variable memory device including a carbide-based solid electrolyte membrane that has stable memory at a high temperature and a manufacturing method thereof. The resistance-variable memory device includes: a lower electrode, the carbide-based solid electrolyte membrane arranged on the lower electrode, and an upper electrode arranged on the solid electrolyte membrane. In addition, the method for manufacturing the resistance-variable memory device comprises: a step for forming the lower electrode on a substrate, a step for forming the carbide-based solid electrolyte membrane on the lower electrode, and a step for forming the upper electrode on the solid electrolyte membrane.
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