Invention Grant
US09231204B2 Low voltage embedded memory having conductive oxide and electrode stacks
有权
具有导电氧化物和电极堆叠的低电压嵌入式存储器
- Patent Title: Low voltage embedded memory having conductive oxide and electrode stacks
- Patent Title (中): 具有导电氧化物和电极堆叠的低电压嵌入式存储器
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Application No.: US13630795Application Date: 2012-09-28
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Publication No.: US09231204B2Publication Date: 2016-01-05
- Inventor: Elijah V. Karpov , Brian S. Doyle , Charles C. Kuo , Robert S. Chau , Eric R. Dickey , Michael Stephen Bowen , Sey-Shing Sun
- Applicant: Elijah V. Karpov , Brian S. Doyle , Charles C. Kuo , Robert S. Chau , Eric R. Dickey , Michael Stephen Bowen , Sey-Shing Sun
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L45/00 ; G11C13/00

Abstract:
Embodiments include low voltage embedded memory having conductive oxide and electrode stacks. A material layer stack for a memory element includes a first conductive electrode. A conductive oxide layer is disposed on the first conductive electrode. The conductive oxide layer has a plurality of oxygen vacancies therein. A second electrode is disposed on the conductive oxide layer.
Public/Granted literature
- US20140092666A1 LOW VOLTAGE EMBEDDED MEMORY HAVING CONDUCTIVE OXIDE AND ELECTRODE STACKS Public/Granted day:2014-04-03
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