Invention Grant
- Patent Title: Methods and apparatuses for detecting registration offsets
- Patent Title (中): 用于检测登记偏移的方法和装置
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Application No.: US13724981Application Date: 2012-12-21
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Publication No.: US09232632B2Publication Date: 2016-01-05
- Inventor: Xinhong Su , Chen Chen
- Applicant: PEKING UNIVERSITY FOUNDER GROUP CO., LTD. , ZHUHAI FOUNDER TECH HI-DENSITY ELECTRONIC CO., LTD.
- Applicant Address: CN Beijing CN Zhuhai, Guangdong
- Assignee: Peking University Founder Group Co., Ltd.,Zhuhai Founder Tech Hi-Density Electronics Co., Ltd.
- Current Assignee: Peking University Founder Group Co., Ltd.,Zhuhai Founder Tech Hi-Density Electronics Co., Ltd.
- Current Assignee Address: CN Beijing CN Zhuhai, Guangdong
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: CN201110438926 20111221
- Main IPC: H01B12/00
- IPC: H01B12/00 ; H05K1/02 ; H05K3/06 ; H05K3/46

Abstract:
A method for detecting a registration offset is disclosed. The method includes transferring a first pattern to a metal layer on a first side of a printed circuit board (PCB) substrate. The first pattern has a reference scale. The method further includes transferring a second pattern to a metal layer on a second side opposite to the first side of the PCB substrate. The second pattern has a measurement scale. The second pattern is transferred by aligning an origin of the measurement scale with an origin of the reference scale in an apparatus such that at least a portion of the reference scale is overlapped with the measurement scale. The method includes etching the metal layers of the PCB substrate and measuring an offset in the patterns on the PCB substrate by using the reference scale and the measurement scale.
Public/Granted literature
- US20130161072A1 Methods and Apparatuses for Detecting Registration Offsets Public/Granted day:2013-06-27
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