Invention Grant
- Patent Title: Wiring substrate, method for manufacturing the wiring substrate, and semiconductor package
- Patent Title (中): 布线基板,布线基板的制造方法以及半导体封装
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Application No.: US13936443Application Date: 2013-07-08
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Publication No.: US09232642B2Publication Date: 2016-01-05
- Inventor: Junichi Nakamura , Michiro Ogawa , Kazuhiro Kobayashi , Hiromi Denda
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano
- Agency: IPUSA, PLLC
- Priority: JP2012-161067 20120720
- Main IPC: H01L23/373
- IPC: H01L23/373 ; H05K1/02 ; H01L23/48 ; H01L25/10 ; H05K3/46 ; H01L23/14 ; H01L23/498 ; H01L23/485

Abstract:
A wiring substrate includes an insulating layer including a reinforcement member and having a first surface and a second surface positioned on an opposite side of the first surface, an electrode pad exposed from the first surface, a layered body including first insulating layers and being formed on the second surface, the first insulating layers having a first insulating material as a main component, another layered body including second insulating layers and being formed on the layered body, the second insulating layers having a second insulating material as a main component, and another electrode pad exposed from a surface of the another layered body that is opposite to the layered body. The number of the first insulating layers is equal to that of the second insulating layers. The first insulating layers have a thermal expansion coefficient that is greater than that of the second insulating layers.
Public/Granted literature
- US20140021625A1 WIRING SUBSTRATE, METHOD FOR MANUFACTURING THE WIRING SUBSTRATE, AND SEMICONDUCTOR PACKAGE Public/Granted day:2014-01-23
Information query
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