Invention Grant
- Patent Title: Manufacturing method of substrate, manufacturing method of wiring substrate, glass substrate and wiring substrate
- Patent Title (中): 基板的制造方法,布线基板,玻璃基板和配线基板的制造方法
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Application No.: US13624448Application Date: 2012-09-21
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Publication No.: US09232652B2Publication Date: 2016-01-05
- Inventor: Takashi Fushie , Hajime Kikuchi
- Applicant: HOYA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HOYA CORPORATION
- Current Assignee: HOYA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-208143 20110922; JP2012-180212 20120815
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/00 ; H05K3/42 ; H05K1/03 ; H05K3/38

Abstract:
There is provided that a substrate comprising a glass substrate 2 constituted by a glass including a silicon oxide. The glass substrate has a through-hole 3 communicating with a front surface and a rear surface of the glass substrate, and filled with a metal material. The substrate is realized by forming an anchor part by selectively etching a silicon oxide on a sidewall surrounding an inside of said through-hole 3 before filling the metal material and by filling the inside of said through-hole 3 with the metal material after forming the anchor part.
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