Invention Grant
- Patent Title: Material forming supramolecular structures, process and uses
- Patent Title (中): 材料形成超分子结构，工艺和用途
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Application No.: US11603733Application Date: 2006-11-22
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Publication No.: US09234067B2Publication Date: 2016-01-12
- Inventor: Wayne Hayes , Philip James Woodward , Alex Clarke , Andrew Trevithick Slark
- Applicant: Wayne Hayes , Philip James Woodward , Alex Clarke , Andrew Trevithick Slark
- Applicant Address: DE Duesseldorf
- Assignee: Henkel AG & Co. KGaA
- Current Assignee: Henkel AG & Co. KGaA
- Current Assignee Address: DE Duesseldorf
- Agent James E. Piotrowski
- Priority: EP05026211 20051201
- Main IPC: C08G18/00
- IPC: C08G18/00 ; C08G18/32 ; C09J175/02 ; C08G18/10 ; C08G18/28
Abstract:
A novel material, forming supramolecular structures below its transition temperature, which contains at least one C═O and/or C═S group and at least one N—H, O—H and/or S—H group and wherein the material has the structure A(-X—B)n (1) wherein A, X, B and n are defined. Also a process for preparation of the material and uses thereof.
Public/Granted literature
- US20080200718A1 Novel material forming supramolecular structures, process and uses Public/Granted day:2008-08-21
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