Invention Grant
US09235121B2 Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist
有权
光敏树脂组合物，感光膜，永久抗蚀剂和永久抗蚀剂的制造方法
- Patent Title: Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist
- Patent Title (中): 光敏树脂组合物，感光膜，永久抗蚀剂和永久抗蚀剂的制造方法
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Application No.: US14237618Application Date: 2012-08-09
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Publication No.: US09235121B2Publication Date: 2016-01-12
- Inventor: Toshimasa Nagoshi , Shigeo Tanaka
- Applicant: Toshimasa Nagoshi , Shigeo Tanaka
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JPP2011-174885 20110810; JPP2011-214755 20110929
- International Application: PCT/JP2012/070369 WO 20120809
- International Announcement: WO2013/022068 WO 20130214
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/004 ; G03F7/027 ; H05K3/28 ; C08G59/18 ; C08L63/00 ; C08L63/10
Abstract:
The present invention provides a photosensitive resin composition comprising an (a) component: an acid-modified epoxy resin, a (b) component: a photopolymerizable monomer having an ethylenically unsaturated group, a (c) component: a photopolymerization initiator, a (d) component: an epoxy resin, and an (e) component: an inorganic filler, wherein the (a) component comprises an acid-modified bisphenol novolak type epoxy resin and further the photosensitive resin composition satisfies a predetermined condition, and provides a photosensitive film, a permanent resist and a method for producing a permanent resist using the same.
Public/Granted literature
Information query
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