Invention Grant
- Patent Title: Illumination optical unit for microlithography
- Patent Title (中): 用于微光刻的照明光学单元
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Application No.: US13370829Application Date: 2012-02-10
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Publication No.: US09235137B2Publication Date: 2016-01-12
- Inventor: Damian Fiolka , Ralf Stuetzle
- Applicant: Damian Fiolka , Ralf Stuetzle
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102009045135 20090930
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20 ; G02B27/09 ; G21K1/06 ; G21K1/16

Abstract:
An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.
Public/Granted literature
- US20120162627A1 ILLUMINATION OPTICAL UNIT FOR MICROLITHOGRAPHY Public/Granted day:2012-06-28
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