Invention Grant
US09236223B2 Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
有权
带电粒子束写入装置，调整与目标物体表面的入射角的方法以及带电粒子束写入方法
- Patent Title: Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
- Patent Title (中): 带电粒子束写入装置，调整与目标物体表面的入射角的方法以及带电粒子束写入方法
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Application No.: US14155604Application Date: 2014-01-15
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Publication No.: US09236223B2Publication Date: 2016-01-12
- Inventor: Takahito Nakayama , Takanao Touya
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-007682 20130118
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/04 ; B82Y10/00 ; B82Y40/00
Abstract:
A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.
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