Invention Grant
- Patent Title: Variable polarization wafer inspection
- Patent Title (中): 可变偏振晶片检查
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Application No.: US13857744Application Date: 2013-04-05
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Publication No.: US09239295B2Publication Date: 2016-01-19
- Inventor: Xianzhao Peng , Mark Shi Wang , Grace Hsiu-Ling Chen
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corp.
- Current Assignee: KLA-Tencor Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/21 ; G01N21/95
Abstract:
Methods and systems for variable polarization wafer inspection are provided. One system includes one or more polarizing components position in one or more paths of light scattered from a wafer and detected by one or more channels of an inspection system. The polarizing component(s) are configured to have detection polarization(s) that are selected from two or more polarization settings for the polarizing component(s).
Public/Granted literature
- US20130265577A1 Variable Polarization Wafer Inspection Public/Granted day:2013-10-10
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