Invention Grant
US09242004B2 Methods for preparing polymers having low residual monomer content
有权
制备具有低残留单体含量的聚合物的方法
- Patent Title: Methods for preparing polymers having low residual monomer content
- Patent Title (中): 制备具有低残留单体含量的聚合物的方法
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Application No.: US14286673Application Date: 2014-05-23
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Publication No.: US09242004B2Publication Date: 2016-01-26
- Inventor: Danielle L. Clay
- Applicant: WARSAW ORTHOPEDIC, INC.
- Applicant Address: US IN Warsaw
- Assignee: Warsaw Orthopedic, Inc.
- Current Assignee: Warsaw Orthopedic, Inc.
- Current Assignee Address: US IN Warsaw
- Agency: Sorell Lenna & Schmidt LLP
- Main IPC: C08J3/00
- IPC: C08J3/00 ; A61K47/34 ; C08L67/04 ; C08G85/00 ; B29C45/00 ; A61K31/4168

Abstract:
Methods are provided for preparing polymer mixtures having low residual monomer content. The methods comprise mixing the at least two polymers in a solvent to form a polymeric mixture, the polymeric mixture comprising at least one residual monomer; and adding an antisolvent to the polymeric mixture so as to separate the at least two polymers from the polymeric mixture, where the residual monomer is soluble in the antisolvent. In some embodiments, methods are provided for preparing at least two polymers having low residual monomer content, the methods comprise adding an antisolvent to a mixture of at least two polymers dissolved in a solvent so as to precipitate the at least two polymers from the solvent and anti-solvent. The methods provided avoid steps in dry blending of polymers and produces polymer blends that have low residual monomer content.
Public/Granted literature
- US20140296449A1 METHODS FOR PREPARING POLYMERS HAVING LOW RESIDUAL MONOMER CONTENT Public/Granted day:2014-10-02
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