Invention Grant
- Patent Title: Textured substrate for epitaxial film formation, and method for manufacturing the same
- Patent Title (中): 用于外延膜形成的纹理基板及其制造方法
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Application No.: US14381255Application Date: 2013-03-21
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Publication No.: US09242433B2Publication Date: 2016-01-26
- Inventor: Naoji Kashima , Tomonori Watanabe , Shigeo Nagaya , Kunihiro Shima , Shuichi Kubota
- Applicant: TANAKA KIKINZOKU KOGYO K.K.
- Applicant Address: JP Toyko
- Assignee: TANAKA KIKINZOKU KOGYO K.K.
- Current Assignee: TANAKA KIKINZOKU KOGYO K.K.
- Current Assignee Address: JP Toyko
- Agency: Roberts & Roberts, LLP
- Priority: JPP2012-064918 20120322
- International Application: PCT/JP2013/057984 WO 20130321
- International Announcement: WO2013/141272 WO 20130926
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B9/00 ; C30B25/18 ; B32B15/01 ; H01L39/24 ; H01L39/12

Abstract:
The present invention relates to a textured substrate for epitaxial film formation, comprising a textured metal layer at least on one side, wherein the textured metal layer includes a copper layer having a cube texture and a nickel layer having a thickness of 100 to 20000 nm formed on the copper layer; the nickel layer has a nickel oxide layer formed on a surface thereof, having a thickness of 1 to 30 nm, and including a nickel oxide; and the nickel layer further includes a palladium-containing region formed of palladium-containing nickel at an interface with the nickel oxide layer. The top layer of the textured substrate, i.e. the nickel oxide layer, has a surface roughness of preferably 10 nm or less.
Public/Granted literature
- US20150094208A1 ALIGNMENT SUBSTRATE FOR FORMING EPITAXIAL FILM, AND PROCESS FOR PRODUCING SAME Public/Granted day:2015-04-02
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