Invention Grant
- Patent Title: Method for manufacturing water-repellent film, and substrate, nozzle plate, ink jet head, and ink jet recording device
- Patent Title (中): 防水膜的制造方法，基板，喷嘴板，喷墨头，喷墨记录装置
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Application No.: US14792564Application Date: 2015-07-06
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Publication No.: US09242466B2Publication Date: 2016-01-26
- Inventor: Takami Arakawa , Hiroshi Nakayama
- Applicant: FUJIFILM Corporation , Material Design Factory Co., Ltd.
- Applicant Address: JP Tokyo JP Osaka
- Assignee: FUJIFILM Corporation,Material Design Factory Co., Ltd.
- Current Assignee: FUJIFILM Corporation,Material Design Factory Co., Ltd.
- Current Assignee Address: JP Tokyo JP Osaka
- Agency: Studebaker & Brackett PC
- Priority: JP2013-002064 20130109
- Main IPC: B41J2/135
- IPC: B41J2/135 ; B41J2/14 ; C09D183/04 ; B41J2/16
Abstract:
The present invention provides a method for manufacturing a water-repellent film, including an adhesion precursor film forming step of forming, on a substrate, an adhesion precursor film mainly of a Si—O bond with hydrogen directly bonded to Si; an irradiating step of irradiating the adhesion precursor film with excitation energy to increase an OH group present on a surface of the adhesion precursor film to thereby change the adhesion precursor film into an adhesion reinforcing film; and an organic film coating step of coating the adhesion reinforcing film with an organic film by using a silane coupling agent, wherein a content of the hydrogen directly bonded to Si in the adhesion precursor film is 1.0×1017 atoms/cm2 or more in terms of a H2 molecule.
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