Invention Grant
- Patent Title: Sintered material, and process for producing same
- Patent Title (中): 烧结材料及其制造方法
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Application No.: US14006851Application Date: 2012-03-26
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Publication No.: US09243318B2Publication Date: 2016-01-26
- Inventor: Shigekazu Tomai , Shigeo Matsuzaki , Koki Yano , Makoto Ando , Kazuaki Ebata , Masayuki Itose
- Applicant: Shigekazu Tomai , Shigeo Matsuzaki , Koki Yano , Makoto Ando , Kazuaki Ebata , Masayuki Itose
- Applicant Address: JP Tokyo
- Assignee: IDEMITSU KOSAN CO., LTD.
- Current Assignee: IDEMITSU KOSAN CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP2011-065291 20110324
- International Application: PCT/JP2012/002061 WO 20120326
- International Announcement: WO2012/127883 WO 20120927
- Main IPC: C04B35/00
- IPC: C04B35/00 ; C23C14/34 ; C04B35/01 ; H01L21/02
Abstract:
A sintered body which includes at least indium oxide and gallium oxide and comprises voids each having a volume of 14000 μm3 or more in an amount of 0.03 vol % or less.
Public/Granted literature
- US20140014500A1 SINTERED MATERIAL, AND PROCESS FOR PRODUCING SAME Public/Granted day:2014-01-16
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