Invention Grant
- Patent Title: Sensor system for semiconductor manufacturing apparatus
- Patent Title (中): 半导体制造装置传感器系统
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Application No.: US13366498Application Date: 2012-02-06
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Publication No.: US09243319B2Publication Date: 2016-01-26
- Inventor: Ronald Vern Schauer , Raphael Dascoli , Shivan Bhargava
- Applicant: Ronald Vern Schauer , Raphael Dascoli , Shivan Bhargava
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G01P3/489
- IPC: G01P3/489 ; G01P3/44 ; C23C14/50 ; H01L21/67 ; H01L21/68 ; H01L21/683 ; H01L21/687

Abstract:
A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.
Public/Granted literature
- US20120136622A1 SENSOR SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS Public/Granted day:2012-05-31
Information query
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