Invention Grant
- Patent Title: Nanopore device wetting
- Patent Title (中): 纳米孔器件润湿
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Application No.: US13950515Application Date: 2013-07-25
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Publication No.: US09244038B2Publication Date: 2016-01-26
- Inventor: Venkat K. Balagurusamy
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: G01N27/447
- IPC: G01N27/447 ; G01N33/487 ; B82Y30/00

Abstract:
A method for wetting a nanopore device includes filling a first cavity of the nanopore device with a first buffer solution having a first potential hydrogen (pH) value, filling a second cavity of the nanopore device with a second buffer solution having a second pH value, applying a voltage in the nanopore device, and measuring a current in the nanopore device, the current having a current path partially defined by the first cavity, the second cavity, and an orifice communicative with the first cavity and the second cavity.
Public/Granted literature
- US20130334048A1 NANOPORE DEVICE WETTING Public/Granted day:2013-12-19
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