Invention Grant
US09244038B2 Nanopore device wetting 有权
纳米孔器件润湿

Nanopore device wetting
Abstract:
A method for wetting a nanopore device includes filling a first cavity of the nanopore device with a first buffer solution having a first potential hydrogen (pH) value, filling a second cavity of the nanopore device with a second buffer solution having a second pH value, applying a voltage in the nanopore device, and measuring a current in the nanopore device, the current having a current path partially defined by the first cavity, the second cavity, and an orifice communicative with the first cavity and the second cavity.
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