Invention Grant
- Patent Title: Light coupling formation in a waveguide layer
- Patent Title (中): 波导层中的光耦合形成
-
Application No.: US14075186Application Date: 2013-11-08
-
Publication No.: US09244223B2Publication Date: 2016-01-26
- Inventor: Chun-Hao Tseng , Ying-Hao Kuo , Kuo-Chung Yee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: G02B6/122
- IPC: G02B6/122 ; H01L31/0203 ; H01L31/0232 ; G02B6/138

Abstract:
An approach is provided for forming a light coupling in a waveguide layer. The approach involves forming a waveguide layer overlaying an upper surface of a substrate. The approach also involves placing a chip package portion within the waveguide layer in a selected position. The approach further involves forming a molding compound layer overlaying the waveguide layer and the chip package portion. The approach additionally involves curing the molding compound layer to form a cured package. The approach also involves releasing the cured package from the substrate and inverting the cured package. The approach further involves forming a ridge waveguide structure in the waveguide layer by removing a portion of the lower surface of the cured package.
Public/Granted literature
- US20150131938A1 LIGHT COUPLING FORMATION IN A WAVEGUIDE LAYER Public/Granted day:2015-05-14
Information query