Invention Grant
- Patent Title: Photo-alignment exposure method and photo-alignment exposure device
- Patent Title (中): 光取向曝光方法和光取向曝光装置
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Application No.: US14412898Application Date: 2013-03-29
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Publication No.: US09244311B2Publication Date: 2016-01-26
- Inventor: Koichi Kajiyama , Kazushige Hashimoto , Toshinari Arai
- Applicant: V TECHNOLOGY CO., LTD.
- Applicant Address: JP Yokohama-shi, Kanagawa-ken
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Yokohama-shi, Kanagawa-ken
- Agency: Osha Liang LLP
- Priority: JP2012-151629 20120705
- International Application: PCT/JP2013/059576 WO 20130329
- International Announcement: WO2014/006943 WO 20120109
- Main IPC: G02F1/1337
- IPC: G02F1/1337

Abstract:
A photo-alignment exposure method divides each unit image area of a liquid crystal display into a plurality of divided areas and photo-aligns an alignment material film of each of the divided areas in mutually different directions. The method includes a first exposure process that radiates light at an inclined photo-irradiation angle onto an exposed surface of entire the unit image area; and a second exposure process that radiates light onto one area of the divided areas at an inclined photo-irradiation angle different from the photo-irradiation angle in the first exposure process. In the second exposure process, the light is radiated through a mask pattern corresponding to one area of the divided areas, and transmitted light of the mask pattern is condensed by condensing element and radiated onto the area.
Public/Granted literature
- US20150192830A1 PHOTO-ALIGNMENT EXPOSURE METHOD AND PHOTO-ALIGNMENT EXPOSURE DEVICE Public/Granted day:2015-07-09
Information query
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