Invention Grant
US09244346B2 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device 有权
负型感光性树脂组合物,图案形成方法,固化膜,绝缘膜,滤色器和显示装置

Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device
Abstract:
A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.
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