Invention Grant
US09244347B2 Resist composition, compound, polymeric compound and method of forming resist pattern
有权
抗蚀剂组合物，化合物，聚合物和形成抗蚀剂图案的方法
- Patent Title: Resist composition, compound, polymeric compound and method of forming resist pattern
- Patent Title (中): 抗蚀剂组合物，化合物，聚合物和形成抗蚀剂图案的方法
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Application No.: US14291378Application Date: 2014-05-30
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Publication No.: US09244347B2Publication Date: 2016-01-26
- Inventor: Yoshitaka Komuro , Takaaki Kaiho , Toshiaki Hato , Akiya Kawaue , Junichi Tsuchiya , Yoshiyuki Utsumi
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2013-115542 20130531
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/027 ; G03F7/20 ; G03F7/038 ; G03F7/039 ; C07C309/65 ; C07C381/12
Abstract:
A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0− represents a monovalent counteranion).
Public/Granted literature
- US20140356787A1 RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2014-12-04
Information query
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