Invention Grant
US09244362B2 Environmental system including vacuum scavenge for an immersion lithography apparatus
有权
包括用于浸没式光刻设备的真空清除的环境系统
- Patent Title: Environmental system including vacuum scavenge for an immersion lithography apparatus
- Patent Title (中): 包括用于浸没式光刻设备的真空清除的环境系统
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Application No.: US14324607Application Date: 2014-07-07
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Publication No.: US09244362B2Publication Date: 2016-01-26
- Inventor: Andrew J. Hazelton , Michael Sogard
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20

Abstract:
A liquid immersion exposure apparatus includes an optical assembly having a final optical element, from which exposure light is projected through immersion liquid filling an optical path of the exposure light under the final optical element, a containment member surrounding a tip portion of the optical assembly, and a movable stage to hold a substrate and having an upper surface around the held substrate. An apparatus frame supports the optical assembly and the containment member, and an optical mount isolator, which has an actuator, isolates the optical assembly from vibrations of the apparatus frame. A first inlet of the containment member faces at least one of the substrate and the stage and collects fluid from a gap between the containment member and the at least one of the substrate and the stage. A gas supply outlet of the containment member supplies gas to the gap.
Public/Granted literature
- US20140320831A1 ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR AN IMMERSION LITHOGRAPHY APPARATUS Public/Granted day:2014-10-30
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