An exposure apparatus includes a control unit configured to calculate a target exposure amount distribution in a scanning direction within the target shot region using a target exposure amount at a position in the target shot region and a target exposure amount at a position in an adjacent shot region adjacent to the target shot region in the scanning direction and configured to perform a scan exposure for the target shot region while controlling an exposure amount according to scanning of the substrate so as to obtain the calculated target exposure amount distribution as an exposure amount distribution in a scanning direction within the target shot region.