Invention Grant
- Patent Title: Reputation analysis system and reputation analysis method
- Patent Title (中): 声誉分析系统和信誉分析方法
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Application No.: US13511099Application Date: 2010-11-15
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Publication No.: US09245023B2Publication Date: 2016-01-26
- Inventor: Yuzuru Okajima , Shinichi Ando , Satoshi Nakazawa
- Applicant: Yuzuru Okajima , Shinichi Ando , Satoshi Nakazawa
- Applicant Address: JP Tokyo
- Assignee: NEC CORPORATION
- Current Assignee: NEC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-269484 20091127
- International Application: PCT/JP2010/070645 WO 20101115
- International Announcement: WO2011/065295 WO 20110603
- Main IPC: G06F17/30
- IPC: G06F17/30 ; G06Q30/02 ; G06Q10/10

Abstract:
Described are a reputation analysis device, reputation analysis method, and reputation analysis-use program capable of suitably analyzing temporal changes in reputation for an object indicated by a keyword. The disclosed reputation analysis device is provided with a voluntary activity description extraction means for extracting descriptions representing voluntary activity related to an object indicated by a keyword that has been input from within a plurality of documents; and a reputation chronological data estimation means for counting the number of occurrences of voluntary activity at each time point wherein the voluntary activity expressed by a description representing the voluntary activity related to the object has been performed, and estimating reputation chronological data for chronologically representing evaluations for the object by the agents of the voluntary activity.
Public/Granted literature
- US20120239665A1 REPUTATION ANALYSIS SYSTEM AND REPUTATION ANALYSIS METHOD Public/Granted day:2012-09-20
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