Invention Grant
US09245717B2 Gas distribution system for ceramic showerhead of plasma etch reactor
有权
等离子体蚀刻反应器陶瓷喷头的气体分配系统
- Patent Title: Gas distribution system for ceramic showerhead of plasma etch reactor
- Patent Title (中): 等离子体蚀刻反应器陶瓷喷头的气体分配系统
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Application No.: US13118933Application Date: 2011-05-31
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Publication No.: US09245717B2Publication Date: 2016-01-26
- Inventor: Michael Kang , Alex Paterson
- Applicant: Michael Kang , Alex Paterson
- Applicant Address: US CA Fremont
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: US CA Fremont
- Agency: Buchanan, Ingersoll & Rooney PC
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/453 ; H01L21/67 ; H01L21/311 ; B01F15/02 ; C23C16/455 ; H01L21/3065

Abstract:
A gas delivery system for a ceramic showerhead includes gas connection blocks and a gas ring, the gas connection blocks mounted on the gas ring such that gas outlets in the blocks deliver process gas to gas inlets in an outer periphery of the showerhead. The gas ring includes a bottom ring with channels therein and a welded cover plate enclosing the channels. The gas ring can include a first channel extending ½ the length of the gas ring, two second channels connected at midpoints thereof to downstream ends of the first channel, and four third channels connected at midpoints thereof to downstream ends of the second channels. the cover plate can include a first section enclosing the first channel, two second sections connected at midpoints thereof to ends of the first section, and third sections connected at midpoints thereof to ends of the second sections. The channels are arranged such that the process gas travels equal distances for a single gas inlet in the gas ring to eight outlets in the cover ring allowing equal gas flow.
Public/Granted literature
- US20120305190A1 GAS DISTRIBUTION SYSTEM FOR CERAMIC SHOWERHEAD OF PLASMA ETCH REACTOR Public/Granted day:2012-12-06
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