Invention Grant
- Patent Title: Thin film transistor substrate
- Patent Title (中): 薄膜晶体管基板
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Application No.: US13698750Application Date: 2011-05-24
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Publication No.: US09246010B2Publication Date: 2016-01-26
- Inventor: Katsunori Misaki
- Applicant: Katsunori Misaki
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Keating & Bennett, LLP
- Priority: JP2010-159529 20100714
- International Application: PCT/JP2011/002881 WO 20110524
- International Announcement: WO2012/008080 WO 20120119
- Main IPC: H01L29/786
- IPC: H01L29/786 ; G02F1/1368 ; H01L27/12 ; G02F1/1345 ; G02F1/1362

Abstract:
In an oxide semiconductor layer, a degree of oxidation S1 of a portion located on the side of the gate insulating film, and a degree of oxidation S2 of surface layer portions located in connection regions with source and drain electrodes have a relation of S2
Public/Granted literature
- US20130063675A1 THIN FILM TRANSISTOR SUBSTRATE Public/Granted day:2013-03-14
Information query
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