Invention Grant
- Patent Title: Systems and methods for sub-aperture based aberration measurement and correction in interferometric imaging
- Patent Title (中): 用于基于子孔径的像差测量和干涉成像校正的系统和方法
-
Application No.: US14164955Application Date: 2014-01-27
-
Publication No.: US09247874B2Publication Date: 2016-02-02
- Inventor: Abhishek Kumar , Alexandre R. Tumlinson , Rainer Leitgeb
- Applicant: Carl Zeiss Meditec, Inc.
- Applicant Address: US CA Dublin
- Assignee: CARL ZEISS MEDITEC, INC.
- Current Assignee: CARL ZEISS MEDITEC, INC.
- Current Assignee Address: US CA Dublin
- Agency: Morrison & Foerster LLP
- Main IPC: A61B3/12
- IPC: A61B3/12 ; A61B3/10 ; G01N21/47 ; G03H1/08 ; G03H1/00 ; G03H1/04 ; G01N21/17

Abstract:
Systems and methods for sub-aperture correlation based wavefront measurement in a thick sample and correction as a post processing technique for interferometric imaging to achieve near diffraction limited resolution are described. Theory, simulation and experimental results are presented for the case of full field interference microscopy. The inventive technique can be applied to any coherent interferometric imaging technique and does not require knowledge of any system parameters. In one embodiment of the present invention, a fast and simple way to correct for defocus aberration is described. A variety of applications for the inventive method are presented.
Public/Granted literature
Information query