Invention Grant
- Patent Title: Copper powder for conductive paste and method for producing same
- Patent Title (中): 导电浆用铜粉及其制造方法
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Application No.: US13814891Application Date: 2011-09-12
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Publication No.: US09248504B2Publication Date: 2016-02-02
- Inventor: Yuki Kaneshiro , Shinichi Suenaga , Hidefumi Fujita , Minoru Kishida
- Applicant: Yuki Kaneshiro , Shinichi Suenaga , Hidefumi Fujita , Minoru Kishida
- Applicant Address: JP Tokyo
- Assignee: DOWA ELECTRONICS MATERIALS CO., LTD.
- Current Assignee: DOWA ELECTRONICS MATERIALS CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Bachman & LaPointe, P.C.
- Priority: JP2010-220699 20100930; JP2011-196635 20110909
- International Application: PCT/JP2011/071175 WO 20110912
- International Announcement: WO2012/043267 WO 20120405
- Main IPC: B22F9/24
- IPC: B22F9/24 ; B22F1/00 ; C22C9/00 ; H01B1/02 ; H01B1/22 ; C22C1/04 ; B82Y30/00

Abstract:
There are provided a copper powder for conductive paste, which comprises monodisperse and spherical fine copper particles having a sharp particle size distribution and containing no coarse particles and which can form a thinner electrode film while avoiding a bad influence on electric characteristics thereof, and a method for stably producing such a copper powder for conductive paste. After copper is complexed by adding a complexing agent to an aqueous solution containing copper while blowing air into the solution, the blowing of air is stopped, and then, a reducing agent is added to the solution to deposit copper particles by reduction.
Public/Granted literature
- US20130177471A1 COPPER POWDER FOR CONDUCTIVE PASTE AND METHOD FOR PRODUCING SAME Public/Granted day:2013-07-11
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